Model: Elionix ELS-7700 EX E-Beam Lithography SystemLocation: AML 0.17,0.18,0.19 EBL SupraBooking: www.sharedperspective.com/Crann/CoreTech
The Elionix 7700 e-Beam Lithography system is a dedicated electron beam Litho platform which utilizes a ZrO/W thermal field emission source, and an electron column normally operating at an acceleration voltage of 75 kV to write features in a variety of resists, on a variety of substrates. The laser interferometer-controlled stage and an assortment of chucks allow features to be written on substrates up to 6 inches in diameter, as well as on much smaller samples. Patterns to be written can be imported from AutoCAD "dxf" as well as Calma "gds" format, and can also be defined in the native CAD language used by the system. Writing field sizes range from 75 microns to 2.4 mm on a side. Maximum clock speed (1 / minimum delay) is 10 MHz
